Applied Machine Learning

14.08.2020

Englisch

9783030181161

Springer International Publishing

Nein

David Forsyth

494

1st edition 2019

Taschenbuch

David Forsyth grew up in Cape Town. He received a B.Sc. (Elec. Eng.) from the University of the Witwatersrand, Johannesburg in 1984, an M.Sc. (Elec. Eng.) from that university in 1986, and a D.Phil. from Balliol College, Oxford in 1989. He spent three years on the faculty at the University of Iowa, ten years on the faculty at the University of California at Berkeley, and then moved to the University of Illinois. He served as program co-chair for IEEE Computer Vision and Pattern Recognition in 2000, 2011, 2018 and 2021; general co-chair for CVPR 2006 and ICCV 2019, and program co-chair for the European Conference on Computer Vision 2008, and is a regular member of the program committee of all major international conferences on computer vision. He has served six terms on the SIGGRAPH program committee. In 2006, he received an IEEE technical achievement award, in 2009 he was named an IEEE Fellow, and in 2014 he was named an ACM Fellow. He served as Editor-in-Chief of IEEE TPAMI from 2014-2017. He is lead co-author of

machine learning, naive bayes, nearest neighbor, SVM, OCA, PSCS, linear regression, Markov chains, generalized linear models, model selection, EM, structure learning

UYQ - Künstliche Intelligenz UYAM - Mathematik für Informatiker PBT - Wahrscheinlichkeitsrechnung und Statistik

254 mm

17.8 cm