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Bücher Englische Bücher Wissen & Bildung Naturwissenschaft, Medizin, Informatik, Technik Physik & Astronomie Atomphysik & Kernphysik Film Deposition by Plasma Techniques
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Film Deposition by Plasma Techniques
Mitsuharu Konuma (Gebundene Ausgabe, Englisch)
★★★★★
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Optischer Zustand
Beschreibung
Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes… using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level. Dieses Produkt haben wir gerade leider nicht auf Lager.
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Technische Daten
Erscheinungsdatum
30.04.1992
Sprache
Englisch
EAN
9783540540571
Herausgeber
Springer Berlin
Serien- oder Bandtitel
Springer Series in Atomic, Optical, and Plasma Physics
Sonderedition
Nein
Autor
Mitsuharu Konuma
Seitenanzahl
224
Einbandart
Gebundene Ausgabe
Bandzählung
10
Schlagwörter
Plasma, hydrogen, Cross section, molecule, semiconductor, mechanisms, science, particles, negative ions, design, polymer, elastic collision, collision, material, technology
Thema-Inhalt
PHM - Atom- und Molekularphysik
PHF - Materialwissenschaft / Aggregatzustände
TBC - Ingenieurswesen, Maschinenbau allgemein
Höhe
235 mm
Breite
15.5 cm
-.-
★★★★★
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